In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
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Język Angielski ● Format PDF ● ISBN 9781489914309 ● Wydawca Springer US ● Opublikowany 2013 ● Do pobrania 3 czasy ● Waluta EUR ● ID 4714776 ● Ochrona przed kopiowaniem Adobe DRM
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