CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book’s key approach is on characterizations, device processing and electrical measurements. – Addresses challenges and opportunities for the use of CMOS- Covers the latest methods of strain engineering, materials integration to increase mobility, nano-scaled transistor processing, and integration of CMOS with photonic components- Provides a look at the evolution of CMOS technology, including the origins of the technology, current status and future possibilities
Jun Luo & Henry Radamson
CMOS Past, Present and Future [EPUB ebook]
CMOS Past, Present and Future [EPUB ebook]
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Língua Inglês ● Formato EPUB ● ISBN 9780081021408 ● Editora Elsevier Science ● Publicado 2018 ● Carregável 3 vezes ● Moeda EUR ● ID 5811738 ● Proteção contra cópia Adobe DRM
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