Electrophoretic deposition (EPD) is attracting many researchers’ attention nowadays because of its numerous advantages, such as simple deposition apparatus, fast deposition rate, and the ease of deposition with a controlled thickness, compared to the other processing techniques. Chapter One reports the effectiveness of AC-EPD for the deposition and infiltration of various ceramic nanoparticles in an aqueous suspension. In Chapter Two, the authors discuss the functionalization of Sn O2 thick films prepared by electrophoretic deposition. Chapter Three concludes that despite being a wet process, EPD offers easy control of the thickness and morphology of a deposited film through simple adjustments to the deposition time and the applied potential.
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