Douglas C. Neckers & David H. Volman 
Advances in Photochemistry, Volume 22 [PDF ebook] 

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Twenty-first century innovation . today. Advances in Photochemistry
A critical evaluation by internationally recognized experts of some of the most important work currently being done in photochemistry,
Volume 22 of this respected series provides a glimpse into the possible shape of the science tomorrow. Each article is intended as a catalyst for further research and discussion, allowing chemists to widen their interests and broaden the boundaries of experimentation. In this volume
Ultraviolet Photodissociation Studies of Organosulfur Molecules and Radicals: Energetics, Structure Identification, and Internal State Distribution
C. Y. NG
Photoreactive Organic Thin Films in the Light of Bound Electromagnetic Waves
Z. Sekkat and W. Knoll
Elementary Photoprocesses in Designed Chromophore Sequences on -Helical Polypeptides
M. Sisido
The Photochemistry of Indoles
A. Weedon

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Mục lục

Ultraviolet Photodissocation Studies of Organosulfur Molecules and Radicals: Energetics, Structure Identification, and Internal State Distribution (C. Ng).
Photoreactive Organic Thin Films in the Light of Bound Electromagnetic Waves (Z. Sekkat & W. Knoll).
Elementary Photoprocesses in Designed Chromophore Sequences onproportional to -Helical Polypeptides (M. Sisido).
The Photochemistry of Indoles (A. Weedon).
Indexes.

Giới thiệu về tác giả

Douglas C. Neckers is a Mc Master Distinguished Research Professor and Executive Director of the Bowling Green State University Center for Photochemical Sciences. He received his Ph D from the University of Kansas in 1963, and is the recipient of various awards and honors, including the 1999 Inter American Photochemical Society Award for Outstanding Research. His work includes researching and developing new photopolymerization systems and understanding the molecular details of how polymerization occurs after the absorption of light. He has served as Series Editor of Advances in Photochemistry since the publication of Volume 17 in 1992.
David H. Volman, professor emeritus, chemistry, was born in 1916 in Los Angeles California. He received his BS and MS degrees in chemistry from UCLA in 1937 and 1938 and his Ph.D. from Stanford University in 1940. In 1940 he joined UC Davis as an instructor and junior chemist but left during World War II to work as research chemist for the U.S. Office of Scientific Research and Development – US-OSRD . In 1946 Volman returned with his new wife, Ruth Jackson, who he had met at Northwestern University during the war to UC Davis as an assistant professor in the Department of Chemistry. He became a full professor in 1956. His academic honors included a Guggenheim Foundation Fellowship, a research fellowship at Harvard University, and a visiting research professorship at the University of Washington. He was a founding member of Sigma Xi chapters at Stanford University in 1939 and UC Davis in 1947. He retained his membership for life.
Günther von Bünau is the editor of Advances in Photochemistry, Volume 22, published by Wiley.

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Ngôn ngữ Anh ● định dạng PDF ● ISBN 9780470133804 ● Kích thước tập tin 13.6 MB ● Biên tập viên Douglas C. Neckers & David H. Volman ● Nhà xuất bản John Wiley & Sons ● Quốc gia US ● Được phát hành 2009 ● Phiên bản 1 ● Có thể tải xuống 24 tháng ● Tiền tệ EUR ● TÔI 2314209 ● Sao chép bảo vệ không có

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