Based on the authors’ expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
表中的内容
FOREWORD.
PREFACE.
1 NANO-CMOS SCALING PROBLEMS AND IMPLICATIONS.
1.1 Design Methodology in the Nano-CMOS Era.
1.2 Innovations Needed to Continue Performance Scaling.
1.3...
关于作者
BAN P. WONG, IENG MIEE, served for five years as a member of the technical program committee of IEEE International Solid-State Circuits Conference and as session chair, cochair...