John D. (Georgia Institute of Technology, Atlanta, USA) Cressler 
Silicon Heterostructure Handbook [PDF ebook] 
Materials, Fabrication, Devices, Circuits and Applications of SiGe and Si Strained-Layer Epitaxy

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An extraordinary combination of material science, manufacturing processes, and innovative thinking spurred the development of Si Ge heterojunction devices that offer a wide array of functions, unprecedented levels of performance, and low manufacturing costs. While there are many books on specific aspects of Si heterostructures, the Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits, and Applications of Si Ge and Si Strained-Layer Epitaxy is the first book to bring all aspects together in a single source.
Featuring broad, comprehensive, and in-depth discussion, this handbook distills the current state of the field in areas ranging from materials to fabrication, devices, CAD, circuits, and applications. The editor includes ‘snapshots’ of the industrial state-of-the-art for devices and circuits, presenting a novel perspective for comparing the present status with future directions in the field. With each chapter contributed by expert authors from leading industrial and research institutions worldwide, the book is unequalled not only in breadth of scope, but also in depth of coverage, timeliness of results, and authority of references. It also includes a foreword by Dr. Bernard S. Meyerson, a pioneer in Si Ge technology.
Containing nearly 1000 figures along with valuable appendices, the Silicon Heterostructure Handbook authoritatively surveys materials, fabrication, device physics, transistor optimization, optoelectronics components, measurement, compact modeling, circuit design, and device simulation.

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格式 PDF ● 网页 1248 ● ISBN 9781420026580 ● 编辑 John D. (Georgia Institute of Technology, Atlanta, USA) Cressler ● 出版者 CRC Press ● 发布时间 2018 ● 下载 3 时 ● 货币 EUR ● ID 5697203 ● 复制保护 Adobe DRM
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