Sudeb Dasgupta & Brajesh Kumar Kaushik 
Spacer Engineered FinFET Architectures [EPUB ebook] 
High-Performance Digital Circuit Applications

支持

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the Fin FET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

€57.67
支付方式
购买此电子书可免费获赠一本!
格式 EPUB ● 网页 154 ● ISBN 9781351751032 ● 出版者 CRC Press ● 发布时间 2017 ● 下载 3 时 ● 货币 EUR ● ID 8116198 ● 复制保护 Adobe DRM
需要具备DRM功能的电子书阅读器

来自同一作者的更多电子书 / 编辑

95,335 此类电子书