VLSI Electronics Microstructure Science, Volume 16: Lithography for VLSI treats special topics from each branch of lithography, and also contains general discussion of some lithographic methods. This volume contains 8 chapters that discuss the various aspects of lithography. Chapters 1 and 2 are devoted to optical lithography. Chapter 3 covers electron lithography in general, and Chapter 4 discusses electron resist exposure modeling. Chapter 5 presents the fundamentals of ion-beam lithography. Mask/wafer alignment for x-ray proximity printing and for optical lithography is tackled in Chapter 6. Chapters 7 and 8 on metrology deal with the characterization of lithography by measurements of various types. Engineers, scientists, and technical managers in the semiconductor industry, and engineering and applied physics faculty and graduate students will find the text very useful.
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Langue Anglais ● Format PDF ● Pages 374 ● ISBN 9781483217826 ● Éditeur Norman G. Einspruch & R. K. Watts ● Maison d’édition Elsevier Science ● Publié 2014 ● Téléchargeable 3 fois ● Devise EUR ● ID 5733464 ● Protection contre la copie Adobe DRM
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