Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of Si O2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
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格式 PDF ● 网页 183 ● ISBN 9781634839204 ● 编辑 Jeannie Valdez ● 出版者 Nova Science Publishers ● 发布时间 2015 ● 下载 3 时 ● 货币 EUR ● ID 7226242 ● 复制保护 Adobe DRM
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