The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
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语言 英语 ● 格式 PDF ● ISBN 9780444599728 ● 编辑 S. Coffa & G. Ferla ● 出版者 Elsevier Science ● 发布时间 1995 ● 下载 6 时 ● 货币 EUR ● ID 2637866 ● 复制保护 Adobe DRM
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