Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
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语言 英语 ● 格式 PDF ● ISBN 9783662094327 ● 编辑 Jarek Dabrowski & Eicke R. Weber ● 出版者 Springer Berlin Heidelberg ● 发布时间 2013 ● 下载 3 时 ● 货币 EUR ● ID 6343377 ● 复制保护 Adobe DRM
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