Sudeb Dasgupta & Brajesh Kumar (Indian Institute of Technology Roorkee, Uttareakhand, India) Kaushik 
Spacer Engineered FinFET Architectures [PDF ebook] 
High-Performance Digital Circuit Applications

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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the Fin FET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

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Format PDF ● Pages 154 ● ISBN 9781351751049 ● Publisher CRC Press ● Published 2017 ● Downloadable 3 times ● Currency EUR ● ID 5329239 ● Copy protection Adobe DRM
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